A Heat Transfer Model for Graphene Deposition on Ni and Cu Foils in a Roll-to-Roll Plasma Chemical Vapor Deposition System

Abstract High-throughput production is a major bottleneck for integration of graphene-based technologies in existing and future applications. Here, semi-empirical heat transfer model developed to optimize large-scale deposition graphene on Ni Cu foils roll-to-roll (R2R) plasma chemical vapor (CVD) system. Temperature distributions during are recorded with situ temperature measurements using near-IR optical emission spectroscopy. The indicates that foil movement significantly affects the distribution cooling rate foil. Consequently, growth limited lower web speeds which higher, residence time longer. On other hand, can be deposited at relatively higher due moderately high diffusion carbon increased rates up 20 K/s speed. Critical limitations R2R CVD process exist significant effects speed substrate. thermal analysis approach reported here expected aid enhancing throughput systems.